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We have developed a sub-mum Nb/Al-AlN<sub>x</sub>/Nb Josephson junction and integrated circuit fabrication process using deep-UV lithography and inductively coupled plasma etch tools. The baseline(More)
We have developed a low J<sub>c</sub> (100-1000 A/cm<sup>2</sup>) submicrometer Nb integrated circuit fabrication process for SQUID-based quantum computing applications. The baseline process consists(More)