Fritz J. Kub

  • Citations Per Year
Learn More
To make graphene technologically viable, the transfer of graphene films to substrates appropriate for specific applications is required. We demonstrate the dry transfer of epitaxial graphene (EG) from the C-face of 4H-SiC onto SiO(2), GaN and Al(2)O(3) substrates using a thermal release tape. Subsequent Hall effect measurements illustrated that minimal(More)
The degradation mechanisms of AlGaN/GaN high electron mobility transistors (HEMTs) grown on sapphire, Si, and SiC substrates, under 2 MeV proton irradiation are investigated. It was determined by electron channeling contrast imaging that the threading dislocation density of the AlGaN/GaN epitaxial layers is highest on sapphire substrates and lowest on SiC(More)
Mechanical strengthening by grain refinement is a method whereby a material’s strength and hardness can be increased by decreasing the average crystallite grain size. The empirical Hall–Petch relationship mathematically describes grain boundary strengthening and provides guidance for a straightforward way to produce stronger materials. While the phenomenon(More)
We demonstrate three possible scenarios for upgrading current single-mode transmission networks with high capacity few-mode fiber technology using mode-division multiplexing (MDM). The results were obtained from measurements over a number of field-deployed single-mode fiber links with an additional experimental in-line amplified few-mode fiber link. The(More)
Gallium arsenide (GaAs) metal-semiconductor-metal (MSM) photodetectors have unique properties including high-bandwidth, linearity, and biphase response that make them suitable as mixers and programmable weights for microwave and communications applications. An optical technique for microwave single-sideband modulation that uses GaAs MSM photodiodes as(More)
Aerosol deposition (AD) is a thick-film deposition process that can produce layers up to several hundred micrometers thick with densities greater than 95% of the bulk. The primary advantage of AD is that the deposition takes place entirely at ambient temperature; thereby enabling film growth in material systems with disparate melting temperatures. This(More)
High voltage GaN Schottky diodes require a thick blocking layer with an exceptionally low carrier concentration. To this aim, a metal organic chemical vapor deposition process was developed to create a (14 mm) thick stress-free homoepitaxial GaN film. Low temperature photoluminescence measurements are consistent with low donor background and low(More)
New planar GaAs heterojunction bipolar phototransistors have been designed and demonstrated. The devices use a GaAs/Al(0.3)Ga(0.7) As molecular-beam-epitaxy materials system with an Al(0.3)Ga(0.7) As passivated, 10-nm-thick base; a depleted, high-low emitter; and a low emitter-base capacitance. Electrical contact to the emitter is made by a set of parallel,(More)
  • 1