Frederik W. Osterberg

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The introduction of millisecond annealing in advanced CMOS process flows turns out to generate considerable temperature variations which can enhance the device dispersion. In the present work we report on the use of inline Therma-Probe (TP) and Micro Four-Point Probe (M4PP) metrology to assess these temperature variations on shallow trench isolation (STI)(More)
In this paper, we discuss a probe spacing dependence study in order to estimate the accuracy of micro four-point probe measurements on inhomogeneous samples. Based on sensitivity calculations, both sheet resistance and Hall Effect measurements are studied for samples (e.g. laser annealed samples) with periodic variations of sheet resistance, sheet carrier(More)
Hall mobility and sheet carrier density are important parameters to monitor in advanced semiconductor production. If micro Hall Effect measurements are done on small pads in scribe lines, these parameters may be measured without using valuable test wafers. We report how Hall mobility can be extracted from micro four-point measurements performed on a(More)
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