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  • ChiaHua Ho, Tian Yu Shen, +21 authors Yu Ching Chiao
  • Engineering
  • IEEE Symposium on VLSI Technology
  • 2016 (First Publication: 1 June 2016)
  • 12" manufacturable 90nm CMOS fully compatible 1Mb HfO2-ReRAM by 2 extra masks between Metals with BEoL thermal stress immunity is for the first time achieved in this work. Cycle random soft error,Continue Reading