Eitan Anzenberg

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We show that the "sputter patterning" topographical instability is determined by the effects of ion impact-induced prompt atomic redistribution and that erosion--the consensus predominant cause--is essentially irrelevant. We use grazing incidence small angle x-ray scattering to measure in situ the damping of noise or its amplification into patterns via the(More)
Nanoscale surface topography evolution on Ge surfaces irradiated by 1 keV Kr + ions is examined in both directions perpendicular and parallel to the projection of the ion beam on the surface. Grazing incidence small angle x-ray scattering is used to measure in situ the evolution of surface morphology via the linear dispersion relation. A transition from(More)
Plasma-enhanced atomic layer deposition of cobalt oxide onto nanotextured p(+)n-Si devices enables efficient photoelectrochemical water oxidation and effective protection of Si from corrosion at high pH (pH 13.6). A photocurrent density of 17 mA/cm(2) at 1.23 V vs RHE, saturation current density of 30 mA/cm(2), and photovoltage greater than 600 mV were(More)
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