Dongchul Suh

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A method of transferring a bilayer of polymer capped with metal to a substrate is developed with a mould that is coated with a metal followed by a polymer. A self-assembled monolayer chemisorbed on the mould surface plays a key role in the bilayer transfer. This bilayer reversal imprint lithography offers a distinct advantage over other imprint techniques(More)
The spin-coating method, which is widely used for thin film device fabrication, is incapable of large-area deposition or being performed continuously. In perovskite hybrid solar cells using CH(3)NH(3)PbI(3) (MAPbI(3)), large-area deposition is essential for their potential use in mass production. Prior to replacing all the spin-coating process for(More)
A permeability- and surface-energy-controllable polyurethane acrylate (PUA) mold, a "capillary-force material (CFM)" mold, is introduced for capillary-force lithography (CFL). In CFL, the surface energy and gas permeability of the mold are crucial. However, the modulation of these two main factors at a time is difficult. Here, we introduce new CFM molds in(More)
We demonstrate fabrication of structurally regular, nanoscale organic light-emitting diodes ~OLEDs! using room temperature imprint lithography ~RTIL!. An insulating polymer layer spin-coated onto indium-tin oxide ~ITO! glass is patterned by RTIL, followed by etching with an oxygen plasma to define the light-emitting area for the fabrication of OLEDs with 80(More)
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