Dominik Metzler

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The original studies of mental rotation estimated rates of imagining rotations that were much slower when two simultaneously portrayed three-dimensional shapes were to be compared (R. Shepard & J. Metzler) than when one two-dimensional shape was to be compared with a previously learned two-dimensional shape (Cooper and her associates). In a 2 X 2 design, we(More)
The authors studied the effect of the temperature and chemical state of the chamber wall on process performance for atomic layer etching of SiO2 using a steady-state Ar plasma, periodic injection of a defined number of C4F8 molecules, and synchronized plasma-based Ar+ ion bombardment. To evaluate these effects, the authors measured the quartz coupling(More)
With the increasing interest in establishing directional etching methods capable of atomic scale resolution for fabricating highly scaled electronic devices, the need for development and characterization of atomic layer etching processes, or generally etch processes with atomic layer precision, is growing. In this work, a flux-controlled cyclic plasma(More)
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