Dennis W. Hess

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Plasma-assisted oxidation, anodization, and nitridation of silicon have been performed in microwave, rf, and dc plasmas with a variety of reactor configurations and a range of plasma densities. Compared to thermal processes at equivalent substrate temperatures, film growth rates are accelerated by the plasma-enhanced generation of reactive chemical species(More)
Amphiphobic wood has successfully been fabricated using a combination of O2 plasma surface activation and coating of pre-hydrolyzed methyltrimethoxysilane (MTMS). The effect of O2 plasma activation on surface chemistry and surface roughness was investigated using X-ray photoelectron spectroscopy and laser scanning confocal microscope profilometry,(More)
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