Dale L. Critchlow

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An n-channel insulated-gate field-effect transistor technology established at IBM Research has served as the basis for further development leading to FET memory. Designs and characteristics of experimental devices of 500 and 1000 A gate insulator thicknesses are presented, with particular attention to the effects of source-drain spacing. Introduction(More)
During the last decade we have seen a dramatic increase in the complexity of silicon integrated circuit chips, particularly in memory. The n-channel FET technology is dominant in main memory and in lower performance logic and arrays (i.e., read-only memory and buffers) because of its higher circuit density and simpler processing, whereas bipolar transistor(More)
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