D C Hetherington

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Beginning in the mid-1990s, Sandia National Laboratories began its migration to Silicon-on-Insulator (SOI) wafers to develop a radiation-hardened semiconductor process for sub-0.5mum geometries. Successfully radiation hardening SOI technologies enabled an in-house processing familiarity that exceeded our expectations by opening opportunities to improve(More)
Scanning capacitance microscopy was used to study the cross section of an operating p-channel MOSFET. We discuss the novel test structure design and the modifications to the SCM hardware that enabled us to perform SCM while applying dc bias voltages to operate the device. The results are compared with device simulations performed with Davinci.
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