Christian Schlaup

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The underpotential deposition (UPD) of copper on a Pt(111) electrode and the influence of gas coadsorbates, i.e. CO and CO2, on the thus deposited copper layer were studied in a 0.1 M HClO4 electrolyte by means of EC-STM. By UPD, an atomically flat Cu layer is formed, which exhibits a pseudomorphic (1 × 1) structure. However, it contains several point(More)
We have reinvestigated the behavior of a Cu(111) electrode in pure and cinchonidine containing aqueous 0.1 M HClO4 solution by cyclic voltammetry (CV) and in situ electrochemical scanning tunneling microscopy (STM). In contrast to previous publications by Wan et al. (Langmuir 2000, 19, 1958-1962 and references cited therein) on Cu(111) in pure 0.1 M HClO4(More)
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