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IC metrology is a necessary means for measuring the fabrication performance in the semiconductor industry. It is significant for yield enhancement and process control. However, real-time monitoring of wafer production is required in recent years especially for the 300 mm semiconductor manufacturing. Therefore, virtual metrology (VM) is developed for the(More)
This paper presents a novel and simple feature extraction approach for drawing out the signal characteristics of uncertain dynamic processes by the feature neurons. Kohonen network is used to construct the feature neurons to represent its respective local features of a waveform signal. For a class of waveform signals, groups of feature neurons can be(More)
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