Chi Chung Tsai

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  • S F Gong, H T G Hentzell, A E Robertsson, L Hultman, S.-E Homstrom, G Radnoczi +93 others
  • 2005
71 hydrogen plasma treatment 3.6 SUMMARY Room temperature exposure to a RF hydrogen plasma can dramatically reduce the thermal budget for the crystallization of PECVD a-Si:H films. The hydrogen plasma treatment changes the microstructure of the q-Si:Hat the surface, and depletes hydrogen from the surface of the film. The plasma treatment creates seed nuclei(More)
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