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Silicon oxidation by the aerial diffusion of active oxygen species from a UV-irradiated TiO2 surface was evaluated and characterized. The key point was to confirm the oxidation possibility of… (More)
Damascene 구조를 갖는 반도체소자의 구리금속배선 식각공정에서 배선재료에 의해서 발생되는 구리 식각잔류물을 제거하기 위해 oxalic acid (OA), lactic acid (LA) 및 citric acid (CA)의 카르복시산 함유된 반수계 혼합세정액을 제조하고 특성을 분석하였다. 카르복시산은 pH에 따라 카르복실기와 구리이온들과의 다양한… (More)
Etching process of PMMA (Polymethyl Methacrylate) on glass surface was investigated by dry etchingtechnique using remote plasma. To determine the etching characteristics, the remote plasma etching… (More)
Notching in un-doped amorphous silicon gate etching, a profile distortion phenomenon, has been studied and analyzed with low pressure, high density plasmas using HBr/Cl2/O2 chemistries. In contrast… (More)