Byoung G. Min

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In this work a MIM capacitor used to decouple the internal power supply is shown. The 8fF/um<sup>2</sup> planar MIM capacitors of the 90 nm SOI technology are formed by physical vapor deposition of alternating layers of HfO<sub>2</sub> and Ta<sub>2</sub>O<sub>5</sub> dielectrics between TaN electrodes.
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