Bikram Baidya

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Among double patterning techniques, Self-aligned double patterning (SADP) has the advantage of good mask overlay control, which has made SADP a popular double patterning method for sub-32nm technology nodes. However, SADP process places several limitations on design flexibility. This work exploits an alternative post routing approach that has the(More)
—As design of integrated microelectromechanical systems (MEMS) mature, there is an increasing need for verification tools for such mixed-domain layouts. This requires a mixed-domain layout-versus-schematic tool capable of extracting an integrated schematic from the mixed-domain layout and verifying it against the design schematic. This paper reports on a(More)
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