Bharatram Rangarajan

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The growth of silicon oxynitride thin films applying remote inductively coupled, plasma-enhanced chemical vapor deposition is optimized toward high optical quality at a deposition temperature as low as 150°C. Propagation losses of 0.5±0.05 dB/cm, 1.6±0.2 dB/cm, and 0.6±0.06 dB/cm are measured on as-deposited waveguides for wavelengths of 1300, 1550, and(More)
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