Ashok M. Mahajan

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The paper presents the detailed analysis of the interconnect capacitance, crosstalk time and peak crosstalk voltage. The dependency of the couple capacitance and fringe capacitance on the interconnect layer dimensions affects significantly to the interconnect capacitance. The peak crosstalk time obtained to be 13 femtoseconds for 9.6 femtoseconds of(More)
0026-2714/$ see front matter 2011 Elsevier Ltd. A doi:10.1016/j.microrel.2011.01.009 ⇑ Corresponding author. Tel.: +91 257 2257476; fax E-mail addresses:, ammaha Mahajan). A vital parameter interconnect capacitance in the ULSI has been investigated in this paper. The potential and static capacitance under the metal line strip has been(More)
In the present study, the Al/CeO2 / p-Si MOS capacitor was fabricated by depositing the Aluminium (Al) metal layer by thermal evaporation technique on sol-gel derived CeO2 high-k thin films on p-Si substrate. The deposited CeO2 films were characterized by Ellipsometer to study the refractive index that is determined to be 3.62. The FTIR analysis was carried(More)
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