Ashay Narsale

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As device feature size continues to scale down to the nanometer regime, the decreasing critical charge fundamentally reduces noise margins of devices and in turn increases the susceptibility of the ICs to external noise sources such as particle strikes. While protection techniques for memory such as ECC are mature and effective, protections for logic errors(More)
Amorphous thin films of TiO2 deposited by Pulsed Laser Deposition (PLD) method are irradiated by Swift Heavy Ion (SHI) beam. The irradiated films are subsequently annealed by Rapid Thermal Annealing (RTA) method. Atomic Force Microscopy (AFM) study reveals formation of nano-rings on the surface after RTA processing. Phase change is identified by Glancing(More)
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