Low Pressure Chemical Vapor Deposition of Ultra-Thin, Pinhole-Free Amorphous Silicon FilmsAnish Khandekar, Jeff Hull, Sachin Joshi2009 IEEE Workshop on Microelectronics and…2009A method to deposit and characterize ultra-thin (<100Ǻ) amorphous silicon on silicon dioxide substrates is described. Two Si precursors, silane and disilane were compared for film continuity,… (More)