Anil U. Mane

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IO N Lithography followed by plasma etching is the standard method for manufacturing microelectronics. Requirements on lateral resolution and vertical dimensions translate into signifi cant engineering challenges for the lithographic imaging layer (resist). The resist needs to have high resolution, little line-edge roughness, high resistance to plasma(More)
Progress towards the development of a 20 cm sealed tube optical detector with imaging and photon event time stamping is presented. Novel microchannel plates employing borosilicate micro-capillary arrays have been tested. These provide many performance characteristics typical of conventional MCPs, but have been made in sizes up to 20 cm, have low intrinsic(More)
Progress towards the development of a 20 cm sealed tube optical detector with imaging and photon event time stamping is presented. Novel microchannel plates employing borosilicate micro-capillary arrays have been tested. These provide many performance characteristics typical of conventional MCPs, but have been made in sizes up to 20 cm, have low intrinsic(More)
The doping of finFET sidewalls is studied using glancing angle, energetic ion beam recoil mixing of dopant-rich layers made by atomic layer deposited (ALD) films on vertical Si(100) surfaces. Density Function Theory (DTF) calculations show that surface conditions for initiating ALD with BF<sub>3</sub> and PF<sub>3</sub> dopants favor hydroxyl-Si surface(More)
Micro-channel plate (MCP)-based photodetectors are capable of picosecond level time resolution and sub-mm level position resolution, which makes them a perfect candidate for the next generation large area photodetectors. The large-area picosecond photodetector (LAPPD) collaboration is developing new techniques for making large-area photodetectors based on(More)
There are broad interests in selective and localized synthesis in nanodomains of self-assembled block copolymers (BCPs) for a variety of applications. Sequential infiltration synthesis (SIS) shows promise to selectively grow a controllable amount of materials in one type of nanodomain of a self-assembled BCP film. However, the effects of nanostructured(More)
Argonne National Laboratory (ANL) is currently developing 6 cm &#x00D7; 6 cm, all-glass body, sealed photodetectors based on Microchannel Plates (MCPs) functionalized by Atomic Layer Deposition (ALD). A Small Single Tube Processing System (SmSTPS) was constructed for fabricating the photodetectors. A number of first version devices were successfully(More)
In this work we demonstrate how a novel single free electron detector &#x201C;Timed Photon Counter&#x201D; (TiPC) may benefit from ultra-thin MgO transmission dynodes (tynodes). These membranes are fabricated through MEMS process technologies, with atomic layer deposition (ALD) as the most apt technique for growing films of good quality, with excellent(More)
A process and experimental doping profiles for thermal Atomic Layer Deposition of boron using an AlxOy host oxide are described. Simulations for the thermal ALD of elemental phosphorus and its use are discussed for an efficient oxide doping processes. The use of recoil knock-in is illustrated by simulation. A brief summary of conformal doping approaches is(More)
AL NANODIAMONDS. P. R. Heck, M. J. Pellin, A. M. Davis, D. Isheim, D. N. Seidman, J. Hiller, A. Mane, J. Elam, M. R. Savina, O. Auciello, T. Stephan, D. J. Larson, J. Lewis, C. Floss, and T. L. Daulton. Robert A. Pritzker Center for Meteoritics and Polar Studies, Department of Geology, The Field Museum, Chicago, IL. E-mail: prheck@fieldmuseum.org. Chicago(More)