Anatoliy Evtukh

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The formation of silicon tips and nanoporous Si surfaces by metal-assisted chemical etching method has been performed. The electron field emission from sharp silicon nanostructures has been investigated. The influence of residual gas in vacuum chamber has been observed and explained by formation of the negative dipoles on the surface due to the adsorption(More)
This work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification allowed to obtain the close-packed Au nanodrop (ND)(More)
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