Aleksey Gorobchuk

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The effect of O<sub>2</sub> additive concentration on silicon etching process in a tetrafluoromethane-oxygen mixture is investigated on the base of numerical modeling. The calculations were carried out using an advanced mathematical model of a plasma-chemical reactor. The model takes into account peculiarities of plasma kinetics in a RF-discharge. The gas(More)
The effect of RF discharge structure on silicon etching process in CF<inf>4</inf>/O<inf>2</inf> mixture was studied. The calculations were carried out based on an advanced mathematical model of plasma-chemical reactor with taking into account a peculiarities of RF discharge plasma. The model includes the equations of multicomponent physical-chemical(More)
Male rats were exposed to single or repeated (19 days) cold treatment (4°C) and non-cold stress (60-min shaking on a laboratory shuttle device). Retabolil had a hypotensive effect, which was accompanied by the prevention of a stress-induced increase in the concentration of a hypertensive hormone aldosterone. Under conditions of repeated stress, these(More)
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