Albert Hasper

Learn More
A model is presented to calculate the step coverage of blanket tungsten low pressure chemical vapor deposition (W-LPCVD) from tungsten hexafluoride (WF6). The model can calculate tungsten growth in trenches and circular contact holes, in the case of the WF6 reduction by H2, Sill4, or both. The step coverage model predictions have been verified(More)
  • 1