Ahmet Ceyhan

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This paper presents the major limitations to the interconnect technology scaling at future technology generations and demonstrates both evolutionary and radical potential solutions to the BEOL scaling problem. To address the local interconnect challenges, a novel hybrid Al-Cu interconnect technology is introduced. Performances of carbon-based interconnects(More)
In this paper, emerging low-power interconnect options for CMOS and beyond CMOS technologies are reviewed. First, electrical interconnects based on carbon nanotubes and graphene nanoribbons are discussed. It is found that carbon-based electrical interconnects can potentially outperform their conventional Cu counterpart at technology nodes close to or below(More)
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