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Unforced polarization-based optical implementation of Binary logic.
A new method to optically represent and implement binary logic, and some unforced logic gates are implemented, and the introduced architectures are easily adapted for simultaneous cascading, multiple input designs, and integrated optical architecture.
Design of reflection retarders by use of nonnegative film-substrate systems.
A characterization of the zero and positive systems by means of constant-angle-of-incidence contours and constant-thickness contours of the ellipsometric function and an algorithm outlining the design procedures are presented.
Transmission ellipsometry on unsupported film/pellicle: closed-form inversion
We present a brief discussion of the transmission ellipsometric function of an unsupported film/pellicle optical structure. We also briefly discuss different ellipsometric techniques that could be
Ellipsometric function of a film–substrate system: Applications to the design of reflection-type optical devices and to ellipsometry*
The ratio ρ = Rp/Rs of the complex amplitude-reflection coefficients Rp and Rs for light polarized parallel (p) and perpendicular (s) to the plane of incidence, reflected from an optically isotropic
Complete all-optical processing polarization-based binary logic gates and optical processors.
A new parallel processing technique is developed that allows for the creation of multiple-input-multiple-output processors that implement, by itself, any Boolean function, such as specialized or non-specialized microprocessors.
Design of film–substrate single-reflection retarders*
The design steps for film–substrate single-reflection retarders are briefly stated and applied to the SiO2–Si film–substrate system at wavelength 6328 A. The criterion of minimum-maximum error of the
Polarizer-surface-analyzer null ellipsometry for film-substrate systems*
Single-pass polarizer–surface-analyzer null ellipsometry (PSA-NE) can be used to characterize film–substrate systems, provided that the film thickness lies within one of a set of
Inversion of the nonlinear equations of reflection ellipsometry on film-substrate systems☆
Abstract We discuss an inversion procedure to determine the optical properties and film thickness of a transparent film on an absorbing substrate system. The determination of optical properties of
Single-element rotating-polarizer ellipsometer for film-substrate systems
A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the
Principal angle, principal azimuth, and principal-angle ellipsometry of film-substrate systems
When the film thickness is considered as a parameter, a system composed of a transparent film on an absorbing substrate (in a transparent ambient) is characterized by a range of principal angle