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Perspectives on oblique angle deposition of thin films: From fundamentals to devices
Abstract The oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, includingExpand
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Nanocolumnar association and domain formation in porous thin films grown by evaporation at oblique angles.
Porous thin films grown at oblique angles by evaporation techniques are formed by tilted nanocolumnar structures which, depending on the material type and growth conditions, associate along certainExpand
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Antibacterial Nanostructured Ti Coatings by Magnetron Sputtering: From Laboratory Scales to Industrial Reactors
Based on an already tested laboratory procedure, a new magnetron sputtering methodology to simultaneously coat two-sides of large area implants (up to ~15 cm2) with Ti nanocolumns in industrialExpand
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Growth of nanocolumnar thin films on patterned substrates at oblique angles
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A
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Photonic applications of nanocolumnar Au films obtained by glancing angle deposition with magnetron sputtering
Trabajo presentado en IMAGINENANO: European Event in Nanoscience & Nanotechnology, celebrado en Bilbao (Espana), del 13 al 15 de marzo de 2018
Advanced Strategies in Thin Films Engineering by Magnetron Sputtering
This Special Issue contains a series of reviews and papers representing some recent results and some exciting perspectives focused on advanced strategies in thin films growth, thin films engineeringExpand
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Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition
The scientific interest in the growth of nanostructured surfaces and thin films by means of physical vapor deposition (PVD) techniques has undoubtedly increased in the last decade [...].
Black gold coatings fabricated using glancing angle deposition with substrate rotation by sputtering
Trabajo presentado en el Materials Science and Engineering (MSE) European Congress, celebrado en Darmstant (Alemania), del 26 al 28 de septiembre de 2018
High‐Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles
Target poisoning in reactive magnetron sputtering deposition of thin films is an undesired phenomenon, well known for causing a drastic fall of the process efficiency. We demonstrate that when thisExpand
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