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Thermal annealing-induced formation of ZnO nanoparticles: Minimum strain and stress ameliorate preferred c- axis orientation and crystal-growth properties.
Nanocrystalline zinc oxide (ZnO) thin films have been deposited on glass substrates using a sonicated sol–gel dip-coating technique at various thermal annealing (Ta) temperatures. The Ta temperatureExpand
Surface Morphology and Compositional Analysis of Undoped Amorphous Carbon Thin Films via Bias Assisted Pyrolysis-CVD
Amorphous carbon (a:C) were successfully deposited on the silicon surfaces via bias assisted pyrolysis-CVD in the range between 350oC to 500oC with constant of negative bias -50V in 1 hourExpand
Understanding the Development of Halal Food Standard: Suggestion for Future Research
Islam is a comprehensive religion. It urges Muslims to opt for the good and the best in every facet of life including food. Islam has outlined rules and regulations for food preparation which suggestExpand
Deposition of Amorphous Carbon Thin Films via Bias Assisted Pyrolysis-CVD
The as deposited amorphous carbon (a-C) thin films were successfully deposited by using ethanol and palm oil precursors via a novel bias assisted pyrolysis-CVD ranging from 300oC to 550oC withExpand
A Systematic Literature Review on Islamic Values Applied in Quality Management Context
Abstract Contemporary Islamic management scholars have agreed that values are embedded in quality management. Their agreement is grounded on the famous prophetic tradition encouraging diligence inExpand
STRUCTURAL PROPERTIES OF MICRO AND NANO-STRUCTURED AMORPHOUS CARBON FILMS FROM LIQUID HYDROCARBON PRECURSOR IN PHOTOVOLTAIC HETERO JUNCTION SOLAR CELL APPLICATIONS
3 Facuty of Electrical Engineering, UiTM Sarawak, Kampus Kota Samarahan, JalanMeranek, Sarawak Abstract- The micro-structured of as-deposited (a-C) and nano-structured boron-doped amorphous carbonExpand
AFM images of undoped amorphous carbon thin films deposited by bias-assisted thermal-CVD
The undoped of amorphous carbon thin films were deposited by bias assisted thermal-CVD system at various deposition temperatures in the range 300°C to 500°C with fixed negative bias of -40V for 3 hExpand
Structural and electrical properties of nanostructured TiO2 thin film at low molarity
Titanium dioxide, TiO2 is a semiconductor material which has many useful properties. This paper is to clarify the use of sol-gel method in the production of nanostructured TiO2. Since sol-gel methodExpand
Electrical Properties Of Intrinsic Amorphous Carbon Films From Ethanol Precursor
The intrinsic amorphous carbon (a-C) thin films were successfully prepared by via a bias assisted pyrolysis-chemical vapor deposition (CVD) using ethanol as a carbon source. The effect of depositionExpand
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