• Publications
  • Influence
Perspectives on oblique angle deposition of thin films: From fundamentals to devices
Abstract The oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, includingExpand
  • 314
  • 4
  • PDF
Growth of Crystalline TiO2 by Plasma Enhanced Chemical Vapor Deposition
TiO2 thin films in the form of anatase have been prepared by plasma enhanced chemical vapor deposition (PECVD) at 523 K as the substrate temperature and a low working pressure. The study of theExpand
  • 47
  • 3
Reversible superhydrophobic to superhydrophilic conversion of Ag@TiO2 composite nanofiber surfaces.
A new type of superhydrophobic material consisting of a surface with supported Ag@TiO(2) core-shell nanofibers has been prepared at low temperature by plasma-enhanced chemical vapor depositionExpand
  • 74
  • 2
Type of Plasmas and Microstructures of TiO2 Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition
TiO 2 thin films have been prepared at temperatures between 298 and 523 K by plasma enhanced chemical vapor deposition at working pressures of 4 × 10 -3 and 4 × 10 -4 Torr, in this latter case byExpand
  • 45
  • 2
Plasma assisted deposition of single and multistacked TiO2 hierarchical nanotube photoanodes.
We present herein an evolved methodology for the growth of nanocrystalline hierarchical nanotubes combining physical vapor deposition of organic nanowires (ONWs) and plasma enhanced chemical vacuumExpand
  • 8
  • 2
  • PDF
A novel 3D absorption correction method for quantitative EDX-STEM tomography.
This paper presents a novel 3D method to correct for absorption in energy dispersive X-ray (EDX) microanalysis of heterogeneous samples of unknown structure and composition. By using STEM-basedExpand
  • 29
  • 1
  • PDF
Reduced-dose and high-speed acquisition strategies for multi-dimensional electron microscopy
Multi-dimensional electron microscopy has recently gained considerable interest thanks to the advent of microscopes with unprecedented analytical and in situ capabilities. These information-richExpand
  • 30
  • 1
Wetting properties of polycrystalline TiO2 surfaces: a scaling approach to the roughness factors.
This work presents a thorough study on the wettability of polycrystalline anatase TiO(2) thin films prepared at 250 °C in a microwave plasma enhanced chemical vapor deposition (MW-PECVD) reactor withExpand
  • 32
  • 1
Effect of Visible and UV Illumination on the Water Contact Angle of TiO2 Thin Films with Incorporated Nitrogen
Doping TiO2 with nitrogen is recognized as a procedure to get sensitization of this material with visible light. In the present work, incorporation of nitrogen within the structure of TiO2 thin filmsExpand
  • 55
  • 1
Oxygen Optical Sensing in Gas and Liquids with Nanostructured ZnO Thin Films Based on Exciton Emission Detection
Transparent nanocolumnar porous ZnO thin films have been prepared by plasma-enhanced chemical vapor deposition. By controlling the H2/O2 ratio in the plasma gas, the deposition conditions wereExpand
  • 34
  • 1