A.T. Rasin

We don’t have enough information about this author to calculate their statistics. If you think this is an error let us know.
Learn More
Photoresponse of nitrogen and phosphorous doped n-C/p-Si heterostructure have been studied. Camphor (C<sub>10</sub>H<sub>16</sub>O) was used as starting precursor material in both cases. Phosphorous was doped in varying amounts (1%-7% by mass) and Nitrogen was doped in gas phase with varying partial pressure in the range from 0.3 to 50 mTorr. The doped(More)
The spectral photoresponse of nitrogen doped n-type amorphous carbon (n-C:N) films obtained from camphoric carbon (C<sub>10</sub>H<sub>16</sub>O) target on single crystal Si (100) substrate at room temperature is investigated. Photoresponse analyses of the films were done, with different nitrogen partial pressures (NPP) in the range from 0.3 to 50 mTorr,(More)
  • 1