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a r t i c l e i n f o We present a new chlorine-free dry etching process which was used to successfully etch indium antimonide grown on gallium arsenide substrates while keeping the substrate temperature below 150 °C. By use of a reflowed photoresist mask a sidewall with 60 degree positive slope was achieved, whereas a nearly vertical one was obtained when(More)
This paper presents monolithic microwave integrated circuit (MMIC) resonant tunneling diode (RTD) oscillator with high performance: high power at high frequencies. The circuit topology employs two In0.53Ga0.47As/AlAs RTDs in parallel and each device is biased individually. These oscillators operate at 125GHz, 156GHz and 166 GHz with output power 0.34 mW,(More)
—This work presents the implementation of planar Gunn diodes and pseudomorphic high electron mobility transistors (pHEMTs) on the same wafer for the first time. The AlGaAs/InGaAs/GaAs heterostructures were designed for the realisation of pHEMTs on a Gallium Arsenide-based wafer. T-gate technology has been used for the maximisation of the transistor(More)
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