A. A. O. Tay

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We report on a method of fabricating variable patterns of periodic, high aspect ratio silicon nanostructures with sub-50-nm resolution on a wafer scale. The approach marries step-and-repeat nanoimprint lithography (NIL) and metal-catalyzed electroless etching (MCEE), enabling near perfectly ordered Si nanostructure arrays of user-defined patterns to be(More)
The reliability and optical performance of an LED are dependent on its junction temperature. In this paper, the surface temperature of a chip level conversion LED package was measured using thermoreflectance thermography. The junction-ambient thermal resistance of the same LED device was measured using a thermal transient tester and the junction temperature(More)
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